Afterall No. 50
Afterall No. 50
/ Editors: Ute Meta Bauer, Amanda Carneiro, Nav Haq, Amber Husain, Mark Lewis, Adeena Mey, Charles Stankievech.
- University of the Arts London; Autumn/Winter 2020
- 200p; 26x22cm
- Afterall Journal; #50 .
Autumn/Winter 2020
Afterall, a journal of art, context and enquiry, was launched in 1999. Afterall offers in-depth analysis of artists’ work, along with essays that broaden the context in which to understand it.
The journal is published by Central Saint Martins in research and publishing partnership with M HKA, Antwerp; the John H. Daniels Faculty of Architecture, Landscape and Design, University of Toronto; Museum of Art of São Paulo; and in association with The University of Chicago Press.
It was previously produced in association with California Institute of the Arts (2002–2009); Universidad Internacional de Andalucía arteypensamiento (2011–2014); the Smart Museum of Art and the Department of Visual Arts–Open Practice Committee, University of Chicago (2012–2015), the Art Gallery of Ontario (2016–18), and NTU Centre for Contemporary Art Singapore (2017–2020).
English
AP1-(271) Periodicals
Autumn/Winter 2020
Afterall, a journal of art, context and enquiry, was launched in 1999. Afterall offers in-depth analysis of artists’ work, along with essays that broaden the context in which to understand it.
The journal is published by Central Saint Martins in research and publishing partnership with M HKA, Antwerp; the John H. Daniels Faculty of Architecture, Landscape and Design, University of Toronto; Museum of Art of São Paulo; and in association with The University of Chicago Press.
It was previously produced in association with California Institute of the Arts (2002–2009); Universidad Internacional de Andalucía arteypensamiento (2011–2014); the Smart Museum of Art and the Department of Visual Arts–Open Practice Committee, University of Chicago (2012–2015), the Art Gallery of Ontario (2016–18), and NTU Centre for Contemporary Art Singapore (2017–2020).
English
AP1-(271) Periodicals